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US 2002/0159043 A1Published application
Aligner having shared rotation shaft
AssigneeMitsubishi Denki Kabushiki Kaisha
InventorsShuji Nakao, Teruaki Ishiba
Life of this patent
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Abstract
An illumination optical system is revolved at a given speed around a rotation shaft and emanates exposure light onto a reticle. The light having passed through the reticle is projected onto a semiconductor substrate, by means of a projection optical system which is revolved around the rotation shaft such that a relative positional relationship between the illumination optical system and the projection optical system is maintained.
Claims14
An aligner for forming a pattern on a semiconductor substrate by means of exposing comprising:
- a rotation shaft;
- an illumination optical system which is revolved around said rotation shaft and emanates exposure light;
- a reticle through which said exposure light originating from said illumination optical system is passed;
- and
- a projection optical system which is revolved around said rotation shaft such that a relative positional relationship between said illumination optical system and said projection optical system is maintained, and said projection optical system projecting said light passed through said reticle onto said semiconductor substrate.
2 more elements
A method of manufacturing a semiconductor device using an aligner comprising:
- an emanation step of emanating exposure light onto a reticle from an illumination optical system, and said illumination optical system revolving around a rotation shaft;
- and
- a projection step of projecting light passed through said reticle onto a semiconductor substrate by way of a projection optical system, and said projection optical system revolving around said rotation shaft such that a relative positional relationship between said illumination optical system and said projection optical system is maintained.
Dependencies are inferred from the claim text.