Specification determining method, projection optical system making method and adjusting method, exposure apparatus and making method thereof, and computer system

A projection-optical-system making method with which to make a projection optical system used in an exposure apparatus, said method comprising:

• adjusting said projection optical system according to exposure conditions scheduled to be used such that a best focus position in at least one point of an exposure area within the field of said projection optical system is displaced by a given amount, said exposure area being illuminated with exposure illumination light.

A projection-optical-system adjusting method with which to adjust a projection optical system used in an optical apparatus, said adjusting method comprising:

• measuring a wave-front in said projection optical system;
• and
• adjusting said projection optical system based on a result of said measuring of a wave-front.

A projection-optical-system adjusting method with which to adjust a projection optical system used in an exposure apparatus, said adjusting method comprising:

• performing, when setting exposure conditions that a phase-shift mask is used with a coherence factor of smaller than 0.5 as an illumination condition, prior focus correction that displaces a best focus position in at least one point of an exposure area within the field of said projection optical system by a given amount, said exposure area being illuminated with exposure illumination light.

A computer system comprising:

• a first computer into which target information that an optical apparatus is to achieve is inputted;
• and
• a second computer which is connected to said first computer via a communication path and determines the specification of a projection optical system used in said optical apparatus based on said target information received from said first computer via said communication path with using one of a wave-front aberration amount and value corresponding to a wave-front aberration, which said projection optical system is to satisfy, as a standard.

A computer system comprising:

• a first computer which is connected to an exposure apparatus main body which transfers a given pattern onto a substrate via a projection optical system;
• and
• a second computer which is connected to said first computer via a communication path, performs a simulation that obtains a space image formed on the image plane when said projection optical system projects with said pattern, based on information of said pattern received from said first computer via said communication path and known aberration information of said projection optical system, and analyzes said simulation result to determine best exposure conditions.