Substrate transfer device
OwnerSadayuki Wadainventor
Life of this patent
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Abstract
In this substrate transport apparatus, portions connecting a transport chamber (101) with a first load-lock chamber (109) and a second load-lock chamber (110) are provided to linearly align with each other. A processing station (120, 121) for processing a substrate (400) is provided on a position not interfering with rotational motion and telescopic motion of a robot arm (106). A substrate transport apparatus capable of improving the degree of integration of the apparatus while suppressing enlargement of a foot print and implementing common load-lock chambers can be provided by employing this structure.
Claims8
A substrate transport apparatus comprising:
- a robot arm (106) performing rotational motion and telescopic motion for transporting a substrate (400);
- a transport chamber (101, 201) having said robot arm (106) and rendering a plurality of substrate processing chambers (500) substantially circumferentially arrangeable;
- and
- a first load-lock chamber (109) and a second load-lock chamber (110) for placing said substrate (400) transported to said substrate processing chamber (500) by said robot arm (106) in the wait state or for receiving said substrate (400) processed in said substrate processing chamber (500), wherein
- junctions (100F) between said transport chamber (101, 201) and said first load-lock chamber (109) and said second load-lock chamber (110) are provided to linearly align with each other.
A substrate transport apparatus comprising:
- a load-lock chamber (109, 110) arranged on a position opposed to a working passage (700) for transporting a substrate (400);
- a transport chamber (101) arranged on the side of said load-lock chamber (109, 110) opposite to said passage;
- a plurality of substrate processing chambers (500) arranged on the outer periphery of said transport chamber (101);
- and
- a robot arm (106) arranged in said transport chamber (101) for reciprocating between said load-lock chamber (109, 110) and said substrate processing chamber (500) and introducing/discharging said substrate (400), wherein
- the junction surface between said load-lock chamber (109, 110) and said transport chamber (101) has a linear junction (100F) parallel to said working passage (700) for coupling said load-lock chamber (109, 110) through said junction (100F).
Dependencies are inferred from the claim text.