Method for fabricating mgo polycrystalline thin film
AssigneeFujikura Ltd.
InventorsYasuhiro Iijima, Mariko Kimura, Takashi Saito
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Abstract
A polycrystalline thin film of MgO is formed on a substrate by an ion sputtering process wherein the thin film is obtained by irradiating a target with an ion beam to dislodge particles from the target and deposit the particles on the substrate. The film is preferably formed in an atmosphere at a reduced pressure of 3.0×10−2 Pa or lower while keeping the substrate temperature at 300° C. or lower.
Claims14
A method of producing a polycrystalline thin film of MgO, wherein the ion beam sputtering process is employed to form the polycrystalline thin film of MgO on a substrate by irradiating a target with an ion beam to dislodge particles from the target, and deposit the particles on the substrate.
Dependencies are inferred from the claim text.