Measuring apparatus utilizing attenuated total reflection
AssigneeFuji Photo Film Co., Ltd.
InventorsNobuhiko Ogura, Nobufumi Mori, Katsumi Hayashi, Toshihito Kimura
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AssigneeFuji Photo Film Co., Ltd.
InventorsNobuhiko Ogura, Nobufumi Mori, Katsumi Hayashi, Toshihito Kimura
Estimating the term…
Disclosed herein is a measuring apparatus utilizing attenuated total reflection. The measuring apparatus is equipped with a dielectric block, a thin film layer formed on one surface of the dielectric block, an optical system for making a light beam enter the dielectric block so that a condition for total internal reflection is satisfied at an interface between the dielectric block and the thin film layer, and a two-piece photodiode for detecting the light beam totally reflected at the interface. When attenuated total reflection is detected a plurality of times for a single sample, the two-piece photodiode is disposed at a predetermined position relative to a dark line when a first measurement is made. The two-piece photodiode is also disposed at the same position as the predetermined position stored in a storage unit when a second measurement and measurements thereafter are made.
A measuring apparatus utilizing attenuated total reflection, comprising:
A measuring apparatus utilizing attenuated total reflection, comprising:
A measuring apparatus utilizing attenuated total reflection, comprising:
Dependencies are inferred from the claim text.