Mechanized retractable pellicles and methods of use
AssigneeIntel Corporation
InventorsArun Ramamoorthy, Hsing-Chien Ma
Life of this patent
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Abstract
Apparatus and methods to protect a photomask that is used for semiconductor photolithography at wavelengths outside the visible spectrum include a pellicle that is readily retracted during exposure or to provide access to the photomask. The pellicle can be transparent at an inspection wavelength and opaque at an exposure wavelength. In various embodiments, the pellicle is slid, retracted, or pivoted relative to a base aligned with the photomask, thus uncovering the photomask. When overlying the photomask, the pellicle can be secured with magnetic elements, such as magnets or electromagnets. In another embodiment, the pellicle includes a diaphragm that can be opened or closed. Methods of using a pellicle are also described.
Claims42
A pellicle device comprising:
- a base to align with a photomask;
- a pellicle to slide relative to the base between a first position overlying the photomask and a second position not overlying the photomask;
- and
- a transport element to move the pellicle.
A pellicle device comprising:
- a base to align with a photomask;
- a retractable pellicle to move pivotlessly relative to the base between a first position overlying the photomask and a second position away from the photomask;
- and
- a transport element to move the pellicle.
A pellicle device comprising:
- a base to align with a photomask;
- a pellicle to move about a vertical axis relative to the base between a first position overlying the photomask and a second position not overlying the photomask;
- and
- a transport element to move the pellicle.
A pellicle device comprising:
- a base to align with a photomask;
- a pellicle diaphragm, coupled to the base, having a closed position to cover the photomask and having an open position to uncover the photomask.
A pellicle device comprising:
- a base to align with a photomask;
- a pellicle comprising two or more shutters to move relative to the base between a first position overlying the photomask and a second position not overlying the photomask;
- and
- a transport element to move the pellicle.
A method comprising:
- covering a photomask with a retractable pellicle;
- and
- pivotlessly retracting the pellicle away from the photomask to uncover the photomask.
A method comprising:
- covering a photomask with a pellicle that is pivotable about a vertical axis;
- and
- pivoting the pellicle away from the photomask to uncover the photomask.
A method comprising:
- covering a photomask with a pellicle comprising two or more shutters;
- and
- opening the shutters to uncover the photomask.
A method comprising:
- covering a photomask with a pellicle comprising a diaphragm;
- and
- opening the diaphragm to uncover the photomask.
Dependencies are inferred from the claim text.