Correction apparatus that corrects optical shift in two optical units, and exposure apparatus having the same
AssigneeCanon Kabushiki Kaisha
InventorKen-Ichiro Mori
Life of this patent
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Abstract
There is provided a correction apparatus for correcting a shift between optical axes in two separate optical units adapted such that a beam emitted from one unit enters the other, including a converter for converting a positional shift between the optical axes into an angular shift, and an angular corrector for correcting the angular shift.
Claims13
A correction apparatus for correcting a shift between optical axes in two separate optical units adapted such that a beam emitted from one unit enters the other, said correction apparatus comprising:
- a converter for converting a positional shift between the optical axes into an angular shift;
- and
- an angular corrector for correcting the angular shift.
A correction apparatus for correcting a shift between optical paths in two optical units adapted such that a beam emitted from one unit enters the other, said correction apparatus comprising:
- a converter for converting a shift between the optical paths into an angular shift;
- and
- an angular corrector for correcting the angular shift.
A correction apparatus for correcting a shift between optical axes in two separate optical units adapted such that a beam emitted from one unit enters the other, said correction apparatus comprising:
- a first angular corrector for correcting an angular shift between the optical axes;
- a converter for converting a positional shift between the optical axes into an angular shift;
- and
- a second angular corrector for correcting the converted angular shift.
An exposure apparatus comprising:
- a correction apparatus for correcting a shift between optical axes in two separate optical units adapted such that a beam emitted from one unit enters the other, said correction apparatus comprising a converter for converting a positional shift between the optical axes into an angular shift, and an angular corrector for correcting the angular shift a light source in the one unit;
- and
- an optical system in the other unit, that projects a pattern formed on a reticle or mask onto an object to be exposed with light from said light source.
An exposure apparatus comprising:
- a correction apparatus for correcting a shift between optical paths in two optical units adapted such that a beam emitted from one unit enters the other, said correction apparatus comprising a converter for converting a shift between the optical paths into an angular shift, and an angular corrector for correcting the angular shift a light source in the one unit;
- and
- an optical system in the other unit, that projects a pattern formed on a reticle or mask onto an object to be exposed with light from said light source.
An exposure apparatus comprising:
- a correction apparatus for correcting a shift between optical axes in two separate optical units adapted such that a beam emitted from one unit enters the other, said correction apparatus comprising a first angular corrector for correcting an angular shift between the optical axes, a converter for converting a positional shift between the optical axes into an angular shift, and a second angular corrector for correcting the converted angular shift a light source in the one unit;
- and
- an optical system in the other unit, that projects a pattern formed on a reticle or mask onto an object to be exposed with light from said light source.
A device fabricating method comprising the steps of:
- exposing an object to be exposed using an exposure apparatus comprising a correction apparatus for correcting a shift between optical axes in two separate optical units adapted such that a beam emitted from one unit enters the other, said correction apparatus comprising a converter for converting a positional shift between the optical axes into an angular shift, and an angular corrector for correcting the angular shift, and an optical system for projecting a pattern formed on a reticle or mask onto the object to be exposed;
- and
- performing predetermined processes for the object exposed.
A device fabricating method comprising the steps of:
- exposing an object to be exposed using an exposure apparatus comprising a correction apparatus for correcting a shift between optical paths in two optical units adapted such that a beam emitted from one unit enters the other, said correction apparatus comprising a converter for converting a shift between the optical paths into an angular shift, and an angular corrector for correcting the angular shift, and an optical system for projecting a pattern formed on a reticle or mask onto the object to be exposed;
- and
- performing predetermined processes for the object exposed.
A device fabricating method comprising the steps of:
- exposing an object to be exposed using an exposure apparatus comprising a correction apparatus for correcting a shift between optical axes in two separate optical units adapted such that a beam emitted from one unit enters the other, said correction apparatus comprising a first angular corrector for correcting an angular shift between the optical axes, a converter for converting a positional shift between the optical axes into an angular shift, and a second angular corrector for correcting the converted angular shift, and an optical system for projecting a pattern formed on a reticle or mask onto the object to be exposed;
- and
- performing predetermined processes for the object exposed.
Dependencies are inferred from the claim text.