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US 2002/0154190 A1Published application
Ink jet recording head and fabrication method thereof
AssigneeFuji Xerox Co., Ltd.
InventorsKenichi Ohno, Takashi Yagi, Torahiko Kanda
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AssigneeFuji Xerox Co., Ltd.
InventorsKenichi Ohno, Takashi Yagi, Torahiko Kanda
Estimating the term…
In an ink jet recording head including a silicon substrate and at least one ink chamber and at least one ink pool, which are formed in the silicon substrate with a partition wall therebetween, an opening portion is formed in a position corresponding to an apex of the ink pool of one surface of the silicon substrate on which an opening portion for etching the ink chamber is formed and anisotropic etching of the silicon substrate through the opening portion is performed such that an etching from a bottom of the ink pool and the etching from the opening portion are connected to each other immediately below the opening portion to absorb deviation between etching patterns on both surfaces of the silicon substrate to thereby reduce a variation of thickness of the partition wall and to reduce an influence of such deviation on an ink filling function and an ink jetting function of the ink jet recording head.
An ink jet recording head comprising:
A fabrication method for fabricating an ink jet recording head including a silicon substrate, at least one ink chamber formed in said silicon substrate for pressurizing ink filling said ink chamber and at least one ink pool formed in said silicon substrate for supplying ink to said ink chamber, comprising the steps of:
A fabrication method for fabricating an ink jet recording head including a silicon substrate, at least one ink chamber formed in said silicon substrate for pressurizing ink filling said ink chamber and at least one ink pool formed in said silicon substrate for supplying ink to said ink chamber, comprising the steps of:
Dependencies are inferred from the claim text.