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US 2002/0153023 A1Published application
Method for cleaning out silicon-rich oxide in a pre-clean chamber
OwnerChia-ming Kuo, Chao-yuan Huanginventors
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Abstract
A method for cleaning out silicon-rich oxide in a pre-clean chamber includes a fluoride induction step, a plasma formation step and a draw-out step. In this method, a fluoride is employed to produce plasma. The plasma of the fluoride reacts with silicon-rich oxide formed on a bell-jar to produce volatile reactants and then the reactants are drown out. With this method, the silicon-rich oxide on the bell-jar is efficiently and quickly cleaned out.
Claims5
A method for cleaning out silicon-rich oxide in a pre-clean chamber, the pre-clean chamber comprising a bell-jar having silicon-rich oxide formed thereon, comprising
- a fluoride induction step in which a fluoride is induced into the pre-clean chamber;
- a plasma formation step in which the fluoride is ionized into plasma in the pre-clean chamber to react with the silicon-rich oxide on the bell-jar in the pre-clean chamber;
- and
- a draw-out step in which reactants formed by reaction of the plasma with the silicon-rich oxide are drawn out of the pre-clean chamber so as to clear out the silicon-rich oxide on the bell-jar in the pre-clean chamber.
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Dependencies are inferred from the claim text.