Photomask
AssigneeDainippon Printing Co., Ltd.
InventorsKenji Noguchi, Toshiaki Motonaga, Hiro-o Nakagawa, Yasutaka Morikawa, Toshifumi Yokoyama, Takashi Tominaga, Yoshinori Kinase, Junji Fujikawa, Yoichi Takahashi
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Abstract
A photomask is produced which enables the simplification of the steps of lithography. A photomask is provided with shielding patterns made of shielding metallic thin film on a transparent substrate, wherein the photomask further comprises translucent patterns mainly including tantalum of materials selected from tantalum silicide, tantalum oxide, tantalum nitride or mixture thereof.
Claims3
A photomask provided with shielding patterns made of shielding metallic thin film on a transparent substrate, wherein the photomask further comprises translucent patterns mainly including tantalum of materials selected from tantalum silicide, tantalum oxide, tantalum nitride or mixture thereof.
Dependencies are inferred from the claim text.