Method for etching electronic components containing tantalum
OwnerSteven Verhaverbekeinventor
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Abstract
The present invention provides methods of wet processing electronic components having surfaces containing tantalum. In the methods of the present invention, tantalum-containing electronic components are contacted with a tantalum processing fluid comprising a tantalum oxidizing solution containing an oxidizing agent and a fluorine ion producing agent.
Claims28
A method of wet processing electronic components having surfaces containing tantalum comprising contacting the surfaces of the electronic components with a processing fluid comprising a tantalum oxidizing solution and a fluorine ion producing agent maintained at an aqueous pH of 5 or lower.
A method of wet processing electronic components having surfaces containing tantalum comprising:
- (a) placing one or more electronic components having surfaces containing tantalum in a single vessel;
- (b) filling the vessel with a tantalum processing fluid comprising an oxidizing agent and a fluorine ion producing agent having a pH of 5 or lower;
- and
- (c) contacting the electronic components with the tantalum processing fluid for a contact time sufficient to remove tantalum or tantalum nitride from the surfaces of the electronic components.
Dependencies are inferred from the claim text.