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US 2002/0118348 A1Published application
Semiconductor manufacturing device
AssigneeFab Solutions, Inc.
InventorsTakeo Ushiki, Keizo Yamada, Yousuke Itagaki
Life of this patent
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Abstract
The semiconductor manufacturing device according to the present invention having a mechanical drive part which is moved in a vacuum device while holding a substrate includes at least one discharge port for introducing an inert gas into the vacuum device, and a flow rate control part for controlling the inert gas which is discharged into the vacuum device from the discharge port at a constant flow rate.
Claims6
A semiconductor manufacturing device having a mechanical drive part which is moved in a vacuum device while holding a substrate comprising,
- at least one discharge port for introducing inert gas into said vacuum device, and
- a flow rate control part for controlling the inert gas which is discharge into said vacuum device from said discharge port at a constant flow rate.
Dependencies are inferred from the claim text.