Vacuum processing apparatus
AssigneeTokyo Electron Limited
InventorsMakoto Okabe, Hidetoshi Kimura
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Abstract
An object of the disclosure is to provide a vacuum processing apparatus capable of minimizing the size of the whole apparatus by reducing a floor area occupied by a vacuum pump. An etching apparatus 20 for applying an etching process on an object to be processed in a vacuum includes a processing vessel 21 for applying the etching process on a semiconductor wafer W introduced into the vessel 21 and a vacuum pump 30 arranged below the processing vessel 21 so as to be coaxial with the processing vessel 21, for sucking exhaust gas in the processing vessel 21 to form the vacuum.
Claims10
A vacuum processing apparatus for applying a designated process on an object to be processed in a vacuum atmosphere, comprising:
- a processing vessel for applying the designated process on the object introduced thereinto;
- and
- a vacuum pump arranged on either downside or upside the processing vessel so as to be coaxial with the processing vessel, for sucking exhaust gas in the processing vessel thereby to form a vacuum.
A vacuum processing apparatus for applying a designated process on an object to be processed in a vacuum atmosphere, comprising:
- a processing vessel for applying the designated process on the object introduced thereinto, the processing vessel being provided, therein, with a susceptor for mounting the object thereon;
- a vacuum pump constructed cylindrically as a whole and arranged below the susceptor in the processing vessel so as to be coaxial with the processing vessel, for sucking exhaust gas in the processing vessel thereby to form a vacuum;
- and
- a driving mechanism arranged below the susceptor, for moving it up and down, wherein the vacuum pump is arranged around the driving mechanism coaxially therewith.
A vacuum processing apparatus for applying a designated process on an object to be processed in a vacuum atmosphere, comprising:
- a processing vessel for applying the designated process on the object introduced thereinto, the processing vessel being provided, therein, with a susceptor for mounting the object thereon;
- a turbo-molecular vacuum pump constructed cylindrically as a whole and arranged below the susceptor in the processing vessel so as to be coaxial with the processing vessel, for sucking exhaust gas in the processing vessel thereby to form a vacuum,
- the turbo-molecular vacuum pump including:
- a cylindrical inner housing arranged in coaxial with the processing vessel;
- a cylindrical motor stator arranged outside the cylindrical inner housing;
- a number of rotors rotatably arranged with respect to the cylindrical motor stator;
- a cylindrical outer housing arranged outside the rotors;
- and
- a number of stators fixed to the cylindrical outer housing so as to each extend between the adjacent rotors;
- and
- a driving mechanism arranged below the susceptor, for moving it up and down, wherein the vacuum pump is arranged around at least a portion of the driving mechanism coaxially therewith.
Dependencies are inferred from the claim text.