Method for forming a positive image
AssigneeMitsubishi Chemical Corporation
InventorsTOSHIYUKI URANO, ETSUKO HINO, MITSURU SASAKI
Life of this patent
Estimating the term…
Loading patent…
AssigneeMitsubishi Chemical Corporation
InventorsTOSHIYUKI URANO, ETSUKO HINO, MITSURU SASAKI
Estimating the term…
A method for forming a positive image, which comprises exposing an image-forming material comprising a substrate and a positive photosensitive composition layer containing a novolak resin and a photo-thermal conversion material which absorbs light from an image exposure light source and converts it to heat and not containing a thermally decomposable material which decomposes by the action of heat generated by the photo-thermal conversion material upon absorption of light from the image exposure light source, formed on the substrate, followed by development with an alkali developer containing an amphoteric surfactant to form a positive image.
A method for forming a positive image, which comprises exposing an image-forming material comprising a substrate and a positive photosensitive composition layer containing a novolak resin and a photo-thermal conversion material which absorbs light from an image exposure light source and converts it to heat and not containing a thermally decomposable material which decomposes by the action of heat generated by the photo-thermal conversion material upon absorption of light from the image exposure light source, formed on the substrate, followed by development with an alkali developer containing an amphoteric surfactant to form a positive image.
A method for forming a positive image, which comprises exposing an image-forming material comprising a substrate and a positive photosensitive composition layer containing a novolak resin and a photo-thermal conversion material which absorbs light from an image exposure light source and converts it to heat and not containing an onium compound, a diazonium salt and a quinonediazide compound, formed on the substrate, followed by development with an alkali developer containing an amphoteric surfactant to form a positive image.
A method for forming a positive image, which comprises exposing an image-forming material comprising a substrate and a positive photosensitive composition layer containing a novolak resin and a photo-thermal conversion material which absorbs light from an image exposure light source and converts it to heat and having substantially no sensitivity to ultraviolet light, formed on the substrate, followed by development with an alkali developer containing an amphoteric surfactant to form a positive image.
A method for forming a positive image, which comprises exposing an image-forming material comprising a substrate and a positive photosensitive composition layer containing a novolak resin and a photo-thermal conversion material which absorbs light from an image exposure light source and converts it to heat and having a solubility which is not substantially changed even when it is left to stand under white fluorescent light with a light intensity of 400 lux for 10 hours, formed on the substrate, followed by development with an alkali developer containing an amphoteric surfactant to form a positive image.
A method for forming a positive image, which comprises exposing an image-forming material comprising a substrate and a positive photosensitive composition layer containing a novolak resin and a photo-thermal conversion material which absorbs light from an image exposure light source and converts it to heat and not containing a thermally decomposable material which decomposes by the action of heat generated by the photo-thermal conversion material upon absorption of light from the image exposure light source, formed on the substrate, by means of a laser beam of from 650 to 1,300 nm, followed by development with an alkali developer containing an amphoteric surfactant to form a positive image.
Dependencies are inferred from the claim text.