Etching liquid composition
AssigneeKanto Kagaku Kabushiki Kaisha
InventorsNorio Ishikawa, Kiyoto Mori
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Abstract
The invention provides etching liquid compositions for transparent conducting films wherein foaming is suppressed and residues do not occur after etching. The etching liquid compositions include an etching liquid for transparent conducting films and one or more compounds selected from the group consisting of polysulfonic acid compounds and polyoxyethylene-polyoxypropylene block copolymers.
Claims12
An etching liquid composition comprising an etching liquid for transparent conducting films and one or more compounds selected from the group consisting of polysulfonic acid compounds and polyoxyethylene-polyoxypropylene block copolymers.
Dependencies are inferred from the claim text.