Novel polymers and photoresist compositions for short wavelength imaging
AssigneeShipley Company, L.L.C.
InventorsGary N. Taylor, Charles R. Szmanda
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Abstract
The present invention includes new polymers and use of such polymers as a resin component for photoresist compositions, particularly chemically-amplified positive-acting photoresist compositions. Polymers and resists of the invention are particularly useful for imaging with short wavelength radiation, such as sub-200 nm and preferably about 157 nm. Polymers of the invention contain one or more groups alpha to an acidic site that are substituted by one or more electron-withdrawing groups.
Claims34
A photoresist composition comprising:
- a photoactive component and a resin, the resin comprising a substituent that comprises acidic moiety or a latent acidic moiety, wherein one or more carbons alpha to the acidic moiety or latent acidic moiety are substituted by one or more electron-withdrawing groups.
A resin comprising a substituent that comprises acidic moiety or a latent acidic moiety, wherein one or more carbons alpha to the acidic moiety or latent acidic moiety are substituted by one or more electron-withdrawing groups.
Dependencies are inferred from the claim text.