Method for cleaning the surface of substrate to which residues of resist stick
AssigneeKabushiki Kaisha Toshiba
InventorsTatsuhiko Ema, Shinichi Ito
Life of this patent
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Abstract
A TMAH developer is applied to a to-be-processed substrate that has an organic resist film formed thereon and having an LSI pattern created by exposure, thereby developing the resist pattern, followed by rinsing processes in which, while the substrate is being rotated at 500 rpm, ozone water containing 3-ppm ozone gas is applied to the substrate for fifteen seconds, thereby decomposing organic matter sticking to the exposed surface of the substrate, and then hydrogen water containing 1.2-ppm hydrogen gas is applied to the substrate for fifteen seconds, with the substrate rotated at 500 rpm, thereby removing the decomposed organic matter from the substrate.
Claims12
A substrate process method of developing, using a liquid developer, an organic resist film formed on a to-be-processed substrate and having a desired pattern created by exposure, and then rinsing an exposed surface of the substrate, comprising:
- a first rinsing step of rinsing the exposed surface of the substrate using water that contains an oxidizing gas, thereby decomposing organic matter sticking to the exposed surface of the substrate;
- and
- a second rinsing step of rinsing the exposed surface of the substrate using water that contains a deoxidizing gas, thereby removing the decomposed organic matter.
A substrate process method of developing, using a liquid developer, an organic resist film formed on a to-be-processed substrate and having a desired pattern created by exposure, and then rinsing an exposed surface of the substrate, comprising:
- a first rinsing step of rinsing the exposed surface of the substrate using water that contains an oxidizing gas, thereby decomposing organic matter sticking to the exposed surface of the substrate;
- and
- a second rinsing step of rinsing the exposed surface of the substrate using water that contains ammonia, thereby removing the decomposed organic matter.
Dependencies are inferred from the claim text.