Projection exposure apparatus and method of controlling same
AssigneeCanon Kabushiki Kaisha
InventorsSATOSHI AKIMOTO, SHIGEYUKI UZAWA, SHINJI WAKUI
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AssigneeCanon Kabushiki Kaisha
InventorsSATOSHI AKIMOTO, SHIGEYUKI UZAWA, SHINJI WAKUI
Estimating the term…
A projection exposure apparatus includes projection optics for projecting a pattern, which has been formed on a mask or reticle, onto a wafer placed on a stage; an XYZ stage on which the substrate is placed and which is movable along the direction of the optic axis of the projection optics and in a direction orthogonal to the direction of the optic axis; a surface position measurement unit capable of measuring a predetermined position along the optic axis of the projection optics and the relative position of the surface of the substrate on the state; and a vibration measurement unit capable of measuring vibration of the projection optics. The XYZ stage is driven and controlled based upon results of measurement from the surface position measurement unit and vibration measurement unit, thereby reducing deviation between the wafer surface and imaging plane and improving contrast and resolving power.
A projection exposure apparatus having projection optics for projecting a pattern, which has been formed on a original plate, onto a substrate to be exposed, comprising:
A projection exposure apparatus comprising:
A method of controlling a projection exposure apparatus having projection optics for projecting a pattern, which has been formed on a original plate, onto a substrate, and a stage on which the substrate is placed and which is movable along the direction of an optic axis of said projection optics and in a direction orthogonal to the direction of the optic axis, said method comprising:
A method of manufacturing a device using a projection exposure apparatus having projection optics for projecting a pattern, which has been formed on a original plate, onto a substrate, and a stage on which the substrate is placed and which is movable along the direction of an optic axis of said projection optics and in a direction orthogonal to the direction of the optic axis, said method comprising:
Dependencies are inferred from the claim text.