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OwnerRichard J. Pommer, Glen Roeters +1inventors
InventorsRICHARD J. POMMER, GLEN ROETERS, STEPHEN M. AVERY
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The use of ion beam processing in preparation of a substrate's surfaces, particularly a polyimide film such as Upilex®-SS, prior to depositing a metal on the substrate surfaces. In one aspect, the ion beam processing can be used to remove relatively unique forms of surface contaminants without requiring additional cleaning by traditional methods such as chemical or plasma cleaning. In another aspect, the ion beam processing utilizing an anode layer ion source can be used to prepare polyimide films prior to metal deposition to produce substrates having surprisingly good peel strengths. In still another aspect, ion beam processing can be used to minimize differences in surface characteristics between opposite sides of a substrate.
A method for substrate preparation comprising:
A method of preparing a substrate for metal deposition by balancing the surface characteristics of the substrate comprising the steps of:
A method of preparing a substrate for metal deposition by removing laser slag from the substrate without utilizing chemical or plasma cleaning comprising the steps of:
Dependencies are inferred from the claim text.