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US 2001/0055654 A1Published application
Method and apparatus for the deposition of metal nanoclusters and films on a substrate
AssigneeJet Process Corporation
InventorBret L. Halpern
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Abstract
A method for forming metallic nanoclusters upon a substrate includes moving the substrate through a deposition chamber at a predetermined uniform velocity and depositing metallic precursor compounds onto the substrate. The metallic precursor compounds are subsequently bombarded with an ultrasonic jet of atomic hydrogen to form the metallic nanoclusters.
Claims1
A method for forming metallic nanoclusters upon a substrate, said method comprising the steps of:
- moving said substrate through a deposition chamber at a predetermined uniform velocity;
- depositing metallic precursor compounds onto said substrate;
- and
- bombarding said metallic precursor compounds with an ultrasonic jet of atomic hydrogen.
1 more element
Dependencies are inferred from the claim text.