Substrate processing apparatus
AssigneeTokyo Electron Limited
InventorsMasatoshi Kaneda, Michiaki Matsushita
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AssigneeTokyo Electron Limited
InventorsMasatoshi Kaneda, Michiaki Matsushita
Estimating the term…
A substrate processing apparatus is composed of: a mounting table for mounting thereon a cassette including a lid detachably attached on an opening for carrying in/out a wafer; a cassette station for processing the wafer housed in the cassette on the mounting table; a sub-arm mechanism for taking the wafer out of the cassette on the mounting table, transferring it to the cassette station, and returning the wafer after processing to the cassette on the mounting table; a partition plate for partitioning an atmosphere on the sub-arm mechanism side from an atmosphere on the mounting table side; a slide stage for moving the cassette in a direction of an opening of the partition plate on the mounting table; a lid removing mechanism for removing the lid from the opening of the cassette through the opening of the partition plate; and an X-axis cylinder for controlling a thrust of the slide stage. This can prevent a finger or the like from being caught between the cassette and the partition plate when the wafer is carried into the processing system, thereby carrying in the wafer with certainty and safety.
A substrate processing apparatus, comprising:
A substrate processing apparatus, comprising:
Dependencies are inferred from the claim text.