Single-substrate-processing apparatus for semiconductor process
AssigneeTokyo Electron Limited
InventorTakahiro Horiguchi
Life of this patent
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Abstract
A single-substrate-processing apparatus includes an airtight process chamber in which a ceramic worktable is supported by a ceramic pedestal. The bottom of the pedestal is provided with a flange, which is attached to the bottom of the process chamber by a flange holder. The flange holder has upper and lower frames sandwiching the flange therebetween. The flange holder is detachably fixed by fixing bolts to the bottom of the process chamber from outside the process chamber.
Claims20
A single-substrate-processing apparatus for performing a semiconductor process, comprising:
- an airtight process chamber;
- a supply section configured to supply a process gas into the process chamber;
- an exhaust section configured to vacuum-exhaust the process chamber;
- a worktable having a mount face configured to horizontally support a target substrate within the process chamber, the worktable having a table body consisting essentially of a ceramic;
- a heater configured to heat the target substrate through the mount face, the heater comprising a resistance heater embedded in the table body;
- a pedestal configured to stand upright in the process chamber and support the worktable, the pedestal having a pedestal body consisting essentially of a ceramic, and the pedestal body having a flange at a bottom end;
- a flange holder configured to attach the flange to a bottom of the process chamber, the flange holder comprising an upper frame that pushes the flange toward the bottom of the process chamber;
- and
- a fixing member configured to detachably fix the flange holder to the bottom of the process chamber from outside the process chamber, the fixing member penetrating the bottom of the process chamber and engaging with the flange holder.
A single-substrate-processing apparatus for performing a semiconductor process, comprising:
- an airtight process chamber having a bottom provided with an opening formed therein,
- a supply section configured to supply a process gas into the process chamber;
- an exhaust section configured to vacuum-exhaust the process chamber;
- a worktable having a mount face configured to horizontally support a target substrate within the process chamber, the worktable having a table body consisting essentially of a ceramic;
- a heater configured to heat the target substrate through the mount face, the heater comprising a resistance heater embedded in the table body;
- a pedestal configured to stand upright in the process chamber and support the worktable, the pedestal extending from the worktable to the bottom of the process chamber and having an internal hollow portion communicating with the opening, the pedestal having a pedestal body consisting essentially of a ceramic, and the pedestal body having a flange at a bottom end;
- an electrical cable connected to the resistance heater and led out to an outside of the process chamber through the internal hollow portion and the opening;
- a flange holder configured to attach the flange to a bottom of the process chamber, the flange holder comprising an upper frame that pushes the flange toward the bottom of the process chamber, and a lower frame disposed between the upper frame and the bottom of the process chamber, such that the flange is sandwiched between the upper and lower frames, and the upper frame comprising a plurality of parts separated from each other by radial separating lines;
- and
- a fixing member configured to detachably fix the flange holder to the bottom of the process chamber from outside the process chamber, the fixing member penetrating the bottom of the process chamber and engaging with the flange holder, the fixing member comprising a plurality of fixing bolts, and the flange holder having a plurality of female thread portions that respectively engage with the fixing bolts.
Dependencies are inferred from the claim text.