Memory embedded semiconductor integrated circuit and a method for designing the same
AssigneeSony Corporation
InventorsToshio Kobayashi, Naoshi Ikeda
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AssigneeSony Corporation
InventorsToshio Kobayashi, Naoshi Ikeda
Estimating the term…
The present invention clarifies conditions for the development of a memory embedded semiconductor integrated circuit. The total resource CW of a fabrication technique is defined by utilizing the process number or mask number, for example, required for the fabrication. The unit resource CWU is deduced by dividing the total resource CW with the effective wafer area. The unit resource CWU multiplied by the area of the logic gate forming region is defined as the first effective technique resource CWL, that multiplied by the area of the memory cell forming region is defined as the second effective technique resource CWAM, that multiplied by the area of other regions is defined as the third effective technique resource CWP&IO. The fabrication and/or design are compared by using the first to the third effective technique resources CWU, CWL and CWAM, those suitable to the required scales of the memory and the logic circuit are selected.
A method for designing a memory embedded semiconductor integrated circuit having a first region where logic gates are formed, a second region where memory cells are formed, and a third region including all other regions but the first region and the second region, said method comprising the steps of:
A memory embedded semiconductor integrated circuit comprising:
Dependencies are inferred from the claim text.