CMP polishing slurry dewatering and reconstitution

A method for reconstituting a chemical-mechanical polishing fluid comprising:

• a) introducing a measured amount of water into a mixing unit;
• b) introducing a measured amount of a dry particulate solids composition into the mixing unit, wherein the dry particulate solids composition was previously formed from a chemical-mechanical polishing slurry comprising submicron abrasive particles which has had substantially all water removed therefrom;
• c) mixing the water and the slurry with the mixing unit to form a polishing fluid;
• and
• d) filtering the polishing fluid.