Chemical resistant underlayer for positive-working printing plates
AssigneeKodak Polychrome Graphics LLC
InventorsCelin-Savariar Hauck, Gerhard Hauck
Life of this patent
Estimating the term…
Abstract
Multilayer photoimageable elements, useful for forming lithographic printing members, are disclosed. The elements comprise a support, a top layer, and a chemical resistant underlayer. The underlayer is resistant to aggressive washes, such as a UV wash. In one embodiment, the underlayer comprises a copolymer of N-substituted maleimide, methacrylamide, and methacrylic acid. A process for preparing a lithographic printing member is also disclosed.
Claims23
A photoimageable element comprising:
- a) a substrate, the substrate comprising a hydrophilic surface;
- b) an underlayer over the hydrophilic surface;
- and
- c) a top layer over the underlayer:
- wherein:
- the top layer is ink receptive;
- the underlayer is soluble in aqueous alkaline developer;
- the top layer comprises a material that comprises a o-diazonaphthoquinone moiety;
- the underlayer is essentially free of material that comprises the o-diazonaphthoquinone moiety;
- and
- the underlayer has a one-minute soak loss in 80 wt % diacetone alcohol/20 wt % water of less than about 20 wt %.
A photoimageable element comprising:
- a) a substrate, the substrate comprising a hydrophilic surface;
- b) an underlayer over the hydrophilic surface;
- and
- c) a top layer over the underlayer:
- wherein:
- the top layer is ink receptive;
- the underlayer is soluble in aqueous alkaline developer;
- the top layer comprises a material that comprises a o-diazonaphthoquinone moiety;
- the underlayer is essentially free of the material that comprises a o-diazonaphthoquinone moiety;
- and
- the underlayer comprises a first polymeric material that is a copolymer comprising an N-substituted maleimide, methacrylamide, and methacrylic acid.
A process for preparing a lithographic printing member, the process comprising the steps of:
- imagewise exposing a photoimageable element and forming an exposed element comprising exposed and unexposed regions;
- and
- developing the exposed element with a developer and removing the exposed regions without substantially affecting the complementary unexposed regions;
- in which the photoimageable element comprises:
- a) a substrate, the substrate comprising a hydrophilic surface;
- b) an underlayer over the hydrophilic surface;
- and
- c) a top layer over the underlayer:
- wherein:
- the top layer is ink receptive;
- the underlayer is soluble in aqueous alkaline developer;
- the top layer comprises a material that comprises a o-diazonaphthoquinone moiety;
- the underlayer is essentially free of material that comprises the o-diazonaphthoquinone moiety;
- and
- the underlayer has a one-minute soak loss in 80 wt % diacetone alcohol/20 wt % water of less than about 20 wt %.
Dependencies are inferred from the claim text.