Method to control nested to isolated line printing
AssigneeInternational Business Machines Corporation
InventorsOREST BULA, DANIEL C. COLE, EDWARD W. CONRAD, WILLIAM C. LEIPOLD
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Abstract
A method and structure for a photomask that includes a substrate having a first transmittance, a first pattern to be transferred to a photosensitive layer (the first pattern having a second transmittance lower than the first transmittance) and a second pattern having a third transmittance greater than the second transmittance and less than the first transmittance. The second pattern is adjacent at least a portion of the first pattern, and the substrate and the second pattern transmit light substantially in phase.
Claims21
A photomask comprising:
- a substrate having a first transmittance;
- a first pattern to be transferred to a photosensitive layer, said first pattern having a second transmittance, lower than said first transmittance;
- and
- a second pattern having a third transmittance greater than said second transmittance and less than said first transmittance, said second pattern being adjacent at least a portion of said first pattern,
- wherein said substrate and said second pattern transmit light substantially in phase.
A method of preparing a photomask comprising:
- supplying a substrate having a first transmittance;
- forming a first pattern to be transferred to a photosensitive layer, said first pattern having a second transmittance, lower than said first transmittance;
- and
- forming a second pattern having a third transmittance greater than said second transmittance and less than said first transmittance, said second pattern being adjacent at least a portion of said first pattern,
- wherein said substrate and said second pattern transmit light substantially in phase.
The method in claim 10, wherein said nested structures are spaced more closely than said isolated structures.
A method of forming a pattern on a photoresist comprising preparing a photomask and exposing said photoresist using said photomask, wherein said preparing of said photomask comprises:
- supplying a substrate having a first transmittance;
- forming a first pattern to be transferred to a photosensitive layer, said first pattern having a second transmittance, lower than said first transmittance;
- and
- forming a second pattern having a third transmittance greater than said second transmittance and less than said first transmittance, said second pattern being adjacent at least a portion of said first pattern,
- wherein said substrate and said second pattern transmit light substantially in phase.
Dependencies are inferred from the claim text.