Method and apparatus for measuring thin film, and thin film deposition system

A thin film deposition system comprising:

• a closed thin film deposition furnace having a X-ray permeable X-ray incidence window and X-ray extraction window;
• thin film substance generating means for generating thin film deposition particles of the thin film substance in the thin film deposition furnace;
• substrate supporting means for supporting a thin film deposition substrate in the thin film deposition furnace at a position for allowing the thin film deposition particles of the thin film deposition substance generated from the thin film substance generating means to adhere on the surface of the substrate;
• a X-ray irradiation unit provided at the outside of the thin film deposition furnace and irradiating a X-ray through the X-ray incidence window toward the surface of the thin film deposition substrate supported in the thin film deposition furnace;
• and
• a X-ray sensing unit provided at the outside of the thin film deposition furnace and sensing the X-ray reflected from the thin film deposition substrate through the X-ray extraction window,
• the X-ray irradiation unit comprising a X-ray source for emitting a divergent X-ray, and a curved monochromator for at least converting the divergent X-ray emitted from the X-ray source into a monochromatic X-ray and for allowing the monochromatic X-ray to converge on the thin film deposition surface of the thin film deposition substrate.

A thin film deposition system comprising:

• a sealed thin film deposition furnace;
• thin film substance generating means for generating thin film deposition particles of the thin film substance in the thin film deposition furnace;
• substrate supporting means for supporting a thin film deposition substrate in the thin film deposition furnace at a position for allowing the thin film deposition particles of the thin film deposition substance generated from the thin film substance generating means to adhere on the surface of the substrate;
• a measuring unit provided at a prescribed site communicating with the thin film deposition furnace, and being capable of disposing the thin film deposition substrate that serves as a thin film deposition sample substrate as a measuring object at a position for allowing the thin film deposition particles of the thin film substance flowing in from the thin film deposition furnace to adhere on the substrate;
• a X-ray incidence window and extraction window provided on the side walls of the measuring unit;
• a X-ray irradiation unit provided at the outside of the thin film deposition furnace and irradiating a X-ray through the X-ray incidence window toward the surface of the thin film deposition sample substrate disposed within the measuring unit;
• and
• a X-ray sensing unit provided at the outside of the thin film deposition furnace and sensing the X-ray reflected from the thin film deposition sample substrate through the X-ray extraction window,
• the X-ray irradiation unit comprising a X-ray source for emitting a divergent X-ray, and a curved monochromator for at least converting the divergent X-ray emitted from the X-ray source into a monochromatic X-ray and for allowing the monochromatic X-ray to converge on the thin film deposition surface of the thin film deposition sample substrate.

A thin film deposition system comprising:

• a sealed thin film deposition furnace having a X-ray permeable X-ray incidence window and X-ray extraction window;
• thin film substance generating means for generating thin film deposition particles of the thin film substance in the thin film deposition furnace;
• substrate supporting means for supporting a thin film deposition substrate in the thin film deposition furnace at a position for allowing the thin film deposition particles of the thin film deposition substance generated from the thin film substance generating means to adhere on the surface of the substrate;
• a shield member facing the surface of the thin film deposition substrate supported in the thin film deposition furnace;
• a thin film deposition opening formed at a part of the shield member and for allowing a part of the thin film deposition substrate to expose so that the thin film deposition particles of the thin film deposition substance generated from the thin film substance generating means are adhered on the exposed part;
• a sample thin film deposition opening formed at another part of the shield member and for allowing another part of the thin film deposition substrate to expose so that the thin film deposition particles of the thin film deposition substance generated from the thin film substance generating means are adhered on the another exposed part;
• rotary drive means for relatively changing a part of the surface facing the sample thin film deposition opening by allowing the thin film deposition substrate to rotate;
• a X-ray irradiation unit disposed at the outside of the thin film deposition furnace and irradiating a X-ray through the X-ray incidence window and the sample thin film deposition opening toward a part of the surface of the thin film deposition substrate supported in the thin film deposition furnace;
• and
• a X-ray sensing unit disposed at the outside of the thin film deposition furnace and sensing the X-ray reflected from a part of the surface of the thin film deposition substrate through the sample thin film deposition opening and the X-ray extraction window,
• the X-ray irradiation unit comprising a X-ray source for emitting a divergent X-ray, and a curved monochromator for at least converting the divergent X-ray emitted from the X-ray source into a monochromatic X-ray and for allowing the monochromatic X-ray to converge on the thin film deposition surface of the thin film deposition sample substrate.