Illumination optical system for use in projection exposure apparatus
AssigneeCanon Kabushiki Kaisha
InventorKenichiro Mori
Life of this patent
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Abstract
Disclosed is an illumination optical system for illuminating a surface, to be illuminated, with use of light from a light source, which includes a diffractive optical element for forming a desired light intensity distribution upon a predetermined plane, and an angular distribution transforming unit for transforming an angular distribution of light incident or to be incident on the diffractive optical element into a desired distribution.
Claims17
An illumination optical system for illuminating a surface, to be illuminated, with use of light from a light source, comprising;
- a diffractive optical element for forming a desired light intensity distribution upon a predetermined plane;
- and
- an angular distribution transforming unit for transforming an angular distribution of light incident or to be incident on said diffractive optical element into a desired distribution.
An illumination optical system for illuminating a surface, to be illuminated, with use of light from a light source, comprising:
- a diffractive optical element for forming a desired light intensity distribution upon a predetermined plane;
- and
- a blocking member for blocking zero-th order diffraction light produced by said diffractive optical element.
An exposure apparatus, comprising:
- an illumination optical system for illuminating a mask, to be illuminated, with use of light from a light source, said illumination optical system including (i) a diffractive optical element for forming a desired light intensity distribution upon a predetermined plane, and (ii) an angular distribution transforming unit for transforming an angular distribution of light incident or to be incident on said diffractive optical element into a desired distribution;
- and
- a projection optical system for projecting a pattern of the mask, illuminated with light from said illumination optical system, onto a wafer.
An exposure apparatus, comprising:
- an illumination optical system for illuminating a surface, to be illuminated, with use of light from a light source, said illumination optical system including (i) a diffractive optical element for forming a desired light intensity distribution upon a predetermined plane, and (ii) a blocking member for blocking zero-th order diffraction light produced by said diffractive optical element;
- and
- a projection optical system for projecting a pattern of the mask, illuminated with light from said illumination optical system, onto a wafer.
A device manufacturing method, comprising the steps of:
- applying a photosensitive material to a wafer;
- illuminating a mask surface, to be illuminated, by use of light from an illumination optical system, said illumination optical system including (i) a diffractive optical element for forming a desired light intensity distribution upon a predetermined plane, and (ii) an angular distribution transforming unit for transforming an angular distribution of light incident or to be incident on said diffractive optical element into a desired distribution;
- transferring, by use of a projection optical system, a pattern of the mask onto a wafer;
- and
- developing the transferred pattern.
A device manufacturing method, comprising the steps of:
- applying a photosensitive material to a wafer;
- illuminating a mask surface, to be illuminated, by use of light from an illumination optical system, said illumination optical system including (i) a diffractive optical element for forming a desired light intensity distribution upon a predetermined plane, and (ii) a blocking member for blocking zero-th order diffraction light produced by said diffractive optical element;
- transferring, by use of a projection optical system, a pattern of the mask onto a wafer;
- and
- developing the transferred pattern.
Dependencies are inferred from the claim text.