Position detection device, apparatus using the same, exposure apparatus, and device manufacturing method using the same
AssigneeCanon Kabushiki Kaisha
InventorsKENJI SAITO, TOSHIHIKO TSUJI, MITSURO SUGITA
Life of this patent
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Abstract
Near-field light pumped in the vicinity of an alignment mark upon irradiating pumping light onto the alignment mark formed on the object surface is detected by a probe. Based on the near-field light detected by the probe, the position information of the object is detected.
Claims52
A position detection device for detecting a position of an object, comprising:
- irradiation means for irradiating light onto an alignment mark formed on a surface of the object;
- a probe for detecting near-field light in the vicinity of the alignment mark upon irradiation by said irradiation means;
- and
- detection means for detecting position information of the object on the basis of the near-field light detected by said probe.
An exposure apparatus which detects position information of an object to be exposed applied with a resist using a fine alignment system, aligns the object to be exposed using a signal from said fine alignment system, and forms a pattern by irradiating exposure light onto a surface of the object, said fine alignment system comprising:
- irradiation means for irradiating light onto an alignment mark formed on the object to be exposed or a substrate on which the object to be exposed is placed;
- a probe for interacting with a near field in the vicinity of the alignment mark;
- an optical detector for receiving near-field light present in the near field using said probe;
- control means for obtaining position information of the object to be exposed using a signal from said optical detector;
- and drive means for aligning the object to be exposed by driving the object on the basis of a signal from said control means.
An exposure apparatus for irradiating exposure light onto a surface of an object to be exposed applied with a resist to form a pattern on the surface, wherein near-field light is used as the exposure light.
An exposure apparatus for irradiating exposure light onto a surface of a substrate applied with a resist to form a pattern on the surface, wherein said apparatus uses different exposure means on the basis of a type of microstructure of a pattern.
Dependencies are inferred from the claim text.