Method and apparatus for removing a liquid from a surface of a rotating substrate

A method of removing a liquid from a first side and a second side of at least one substrate comprising the steps of:

• subjecting said substrate to a rotary movement
• supplying a liquid an at least a part of said first side and at least a part of said second side of said substrate;
• and
• supplying a gaseous substance to said first side and said second side of said substrate while supplying said liquid, said gaseous substance being at least partially miscible with said liquid and when mixed with said liquid yielding a mixture having a surface tension being lower than that of said liquid.

An apparatus for removing a liquid from at least one surface of at least one substrate, said apparatus comprising:

• a substrate holder which is subjectable to a rotary movement, said substrate being releasably held by said substrate holder;
• at least one liquid supply system for applying a liquid on at least a part of said surface of said substrate;
• at least one gaseous substance supply system for applying a gaseous substance on said surface of said substrate;
• and said gaseous substance supply system and said liquid supply system being positioned such that said gaseous substance is applied closer to the centre of said rotary movement of said substrate holder than said liquid.

An apparatus for removing a liquid from a first side and a second side of at least one substrate, said apparatus comprising:

• a substrate holder which is subjectable to a rotary movement, said substrate being releasably held by said substrate holder;
• a first and a second liquid supply system, said first liquid supply system for applying a liquid on at least a part of said first side of said substrate and said second liquid supply system for applying a liquid on at least a part of said second side of said substrate;
• a first and a second gaseous substance supply system, said first gaseous substance supply system for applying a gaseous substance on said first side of said substrate and said second gaseous substance supply system for applying a gaseous substance on said second side of said substrate;
• and said first gaseous substance supply system and said first liquid supply system being positioned such that said gaseous substance is applied closer to the centre of said rotary movement of said substrate holder than said liquid, and said second gaseous substance supply system and said second liquid supply system being positioned such that said gaseous substance is applied closer to the centre of said rotary movement of said substrate holder than said liquid.