Method for chamfering a wafer

Abstract

In the wafer chamfering method, there is used a disk-shaped grindstone 8 which includes: a peripheral edge portion serving as a grinding surface 1; a flat portion formed in the central portion of the grinding surface 1 in the width direction thereof; and, two edge portions 5 respectively formed on the two sides of the flat portion 2 in the width direction thereof and made in the form of the shape of the valley portion of the notch portion 4 of a disk-shaped wafer 3 to be chamfered. In operation, in the wafer chamfering method, while rotating the above grindstone 8, the grindstone 8 is revolved in the thickness direction of the wafer 3 to thereby chamfer the wafer 3. Especially, the present wafer chamfering method comprises two steps: that is, a circumferential portion grinding step in which the grindstone is supported such that it stands upright or at right angles to the circumferential portion 6 of the wafer 3 at their respective mutual contact points and only the flat portion of the grindstone 8 is contacted with the mutual contact points to thereby chamfer the peripheral edge portion of the wafer 3; and, a notch portion grinding step in which the grindstone is supported such that it is inclined with respect to the diameter direction of the notch portion of the wafer 3 by an angle of about 45° in the circumferential direction of the wafer 3 and the edge portions 5 or both of the edge portions 5 and flat portion 2 are used to chamfer the notch portion 4 of the wafer 3.

Dependencies are inferred from the claim text.