Test photomask and method for invertigating esd-induced reticle defects
AssigneeDuPont Photomasks, Inc.
InventorAndreas Englisch
Life of this patent
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Abstract
A method and apparatus for monitoring and evaluating effects of electrostatic discharge associated with semiconductor manufacturing are disclosed. The method may include, for example, exposing a test photomask that contains an ESD sensitive geometry to a single or a variety of semiconductor manufacturing procedures. The test photomask may be analyzed to determine how much, if any, degradation of its geometry has occurred as a result of the exposure.
Claims23
A method for monitoring electrostatic discharge effects, comprising:
- exposing a test photomask having an electrostatic discharge sensitive geometry formed thereon to a semiconductor manufacturing procedure;
- and
- analyzing the test photomask to identify and evaluate the severity of electrostatic discharge effects associated with the semiconductor manufacturing procedure.
A method for monitoring severity of electrostatic discharge effects, comprising:
- contacting a test photomask having an electrostatic discharge sensitive geometry formed thereon with a piece of semiconductor manufacturing equipment;
- removing the test photomask from the piece of semiconductor manufacturing equipment;
- and
- analyzing the test photomask to determine the severity of any electrostatic discharge effects associated with the piece of semiconductor manufacturing equipment.
An apparatus for monitoring electrostatic discharge effects associated with semiconductor manufacturing, comprising:
- a photomask;
- an electrostatic discharge sensitive geometry formed on the photomask;
- the geometry having at least one test module defined in part by at least two bodies;
- each body having a surface area sufficient to induce electrostatic discharge effects;
- and
- a line and a gap disposed between the two bodies.
Dependencies are inferred from the claim text.