Compatibilization treatment
AssigneeShipley Company, L.L.C.
InventorsEdward W. Rutter JR., Leo L. Linehan
Life of this patent
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Abstract
Disclosed are compositions and methods for improving compatibility of imaging layers with dielectric layers. Also disclosed are methods of reducing or eliminating poisoning of photoresists during electronic device manufacture.
Claims19
A method of improving compatibility of imaging layers with dielectric layers including the step of contacting the surface of the dielectric layer disposed on a substrate with a composition including one or more acidic components and one or more carriers.
A substrate having a vapor deposited dielectric layer disposed thereon, wherein the dielectric layer is substantially compatible with an imaging layer.
A substrate having a dielectric layer disposed thereon, wherein the dielectric layer is contacted with a composition including one or more acidic components and one or more carriers.
A method for manufacturing an electronic device including the steps of:
- a) providing a dielectric layer on a substrate;
- b) contacting the dielectric layer with a composition including one or more acidic components and one or more carriers;
- and c) disposing on the surface of the dielectric layer an imaging layer.
Dependencies are inferred from the claim text.