Structure and method for manufacturing a semiconductor optical waveguide
AssigneeFurukawa Electric Co., Ltd.
InventorsNorihiro Iwai, Kazuaki Nishikata, Akihiko Kasukawa
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Abstract
A method for manufacturing a semiconductor optical waveguide comprises the steps of forming a core layer having an Al content which monotonically increases from the central part thereof to the film surface, and selectively oxidizing the core layer to obtain a peripheral, oxidized region and a central, non-oxidized region acting as a waveguide. The waveguide is tapered to have a circular mode field at the distal end thereof for efficiently coupling with an optical fiber.
Claims13
A method for manufacturing a semiconductor optical waveguide comprising the steps of forming a first semiconductor layer overlying a semiconductor substrate, said first semiconductor layer having an aluminum concentration which increases from a central part, as viewed in the thickness direction of said semiconductor layer, toward both surfaces of said first semiconductor layer, and selectively oxidizing said first semiconductor layer to obtain a non-oxidized region constituting an optical waveguide and an oxidized region surrounding said non-oxidized region.
Dependencies are inferred from the claim text.