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US 2001/0034313 A1Published application
Non-corrosive stripping and cleaning composition
AssigneeArch Specialty Chemicals, Inc.
InventorsKenji Honda, Richard Mark Molin, Gale Lynne Hansen
Life of this patent
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Abstract
A non-corrosive photoresist stripping and cleaning composition, comprising: (a) about 5% to about 50% of a solvent; (b) about 10% to about 90% of an alkanolamine; (c) about 0.1 to 10% of a carboxylic acid; and (d) about 1.0% to 40% of water.
Claims6
A non-corrosive stripping and cleaning composition, which is free of hydroxylamine and its derivatives, comprising:
- (a) about 5% to 50% by weight of a solvent selected from the group consisting of:
- N-methyl-2-pyrrolidinone, N-hydroxyethyl-2-pyrrolidinone, 1,3-dimethyl-2-imidazolidinone, dimethylsulfoxide, N,N-dimethylacetamide, sulfolane, diacetone alcohol, ethylene glycol, propylene glycol and admixtures thereof;
- (b) about 10% to 90% by weight of an alkanolamine selected from the group consisting of:
- diethyleneglycolamine, monoethanolamine, diethanolamine, triethanolamine, 2-(2-aminoethylamino)ethanol, and admixtures thereof;
- (c) about 0.1% to 10% by weight of a carboxylic acid type corrosion inhibitor;
- and
- (d) about 1% to 40% by weight of water.
4 more elements
A non-corrosive stripping and cleaning composition, which is free of hydroxylamine and its derivatives, comprising:
- (a) about 8-40% by weight N-methyl-2-pyrrolidinone;
- (b) about 20-80% by weight monoethanolamine;
- (c) about 3 to 7% by weight lactic acid;
- and
- (d) about 5-35% water.
2 more elements
Dependencies are inferred from the claim text.