Electron device manufacturing method, a pattern forming method, and a photomask used for those methods

The manufacturing method of an electron device, wherein:

• a photosensitive film provided to the surface of a workpiece to be an electron device is exposed via a mask wherein a light shielding film made of non-metal is partially provided on the surface of a transparent plate on which a concavity or a convexity is partially formed with the film covering the end of the concavity or the convexity and is developed.

A pattern forming method, wherein:

• a light shielding film pattern is projection-exposed on a photosensitive film provided on the surface of a workpiece using a mask wherein phase shift means that inverts the phase of exposure light in printing is partially formed on the surface of a transparent plate and the light shielding film pattern made of non-metal is partially provided with the pattern covering the end of the phase shift means and the exposed photosensitive film is developed.

A pattern forming method, wherein:

• one photosensitive film provided on the surface of a workpiece is projection-exposed multiply using a first mask wherein phase shift means that inverts the phase of exposure light in printing is partially formed on the surface of a transparent plate and a light shielding layout pattern made of non-metal is provided with the pattern covering the end of the phase shift means and a second mask provided with the same second light shielding layout pattern as the light shielding layout pattern of the first mask and second phase shift means the phase of which is inverse to that of the phase shift means of the first mask and the exposed photosensitive film is developed.

The manufacturing method of an electron device, wherein:

• when the light shielding pattern is printed on the surface of a workpiece to be an electron device using a mask on the surface of which a light shielding pattern made of a photoresist is arranged by projection lithography equipment, the surface of the photoresist is printed without touching the surface to the stage of the projection lithography equipment and its carriage means.