Abatement of semiconductor processing gases
AssigneeThe BOC Group, Inc.
InventorsAndrew James Seeley, James Robert Smith
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Abstract
A method for the abatement of one or more pyrophoric gases in a gas stream, which comprises introducing water in to the gas stream and/or mixing the gas stream with preheated air and introducing the gas stream in to a container in which the pyrophoric gases are abated.
Claims20
A method for the abatement of one or more pyrophoric gases in a gas stream, which comprises introducing water in to the gas stream and/or mixing the gas stream with preheated air and introducing the gas stream in to a container in which the pyrophoric gases are abated.
A method for reducing the build up of solid or particulate materials in heated inner surfaces of a container in which pyrophoric gases are being abated which includes means to spray water in to the container.
An apparatus for abating one or more pyrophoric gases in a gas stream comprising a container, means for allowing the introduction of air and a pyrophoric gas containing stream in to the container, means to heat the air prior to it being mixed with the pyrophoric gas stream and means for discharging the treated gas stream.
Dependencies are inferred from the claim text.