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AssigneesNoriyoshi Sato, Satoru Iizuka, Tsukasa Yoneyama, Hiroyasu Sato, Anelva Corporation, Hitachi Kokusai Electric Inc.
InventorsNoriyoshi Sato, Satoru Iizuka, Tsukasa Yoneyama, Hiroyasu Sato, Unryu Ogawa, Yoshio Tominaga, Yoichiro Numazawa, Yukito Nakagawa
Estimating the term…
A plasma processing system provided with a vacuum chamber for accommodating a substrate and for generation of plasma in a space in the front of the same, an antenna provided at the vacuum chamber, and a high frequency power source for supplying high frequency power to the antenna. The antenna emits high frequency power, generates plasma inside the vacuum chamber, and processes the surface of the substrate by the plasma. In the plasma processing system, the antenna has a disk-shaped conductor plate having a predetermined thickness. A coaxial waveguide having a folded portion is formed around the disk-shaped conductor plate. The folded portion of the waveguide is provided with a short-circuit 3 dB directional coupler having an impedance matching function. The antenna having the above structure prevents the generation of a standing wave in the high frequency wave propagation path from the high frequency power source to the vacuum chamber and generates high density plasma by supply of a large power. Due to this, processing of a large area substrate becomes possible.
A plasma processing system comprising:
Dependencies are inferred from the claim text.