Method of simulation of production process of semiconductor device and simulator thereof

A simulator comprising:

• a node displacement-calculating section calculating a displacement of a boundary point in accordance with a process model;
• a node moving section moving the boundary point by the displacement;
• a length-calculating section obtaining lengths of a line segment between the boundary points before and after the boundary point is moved;
• and
• a regulating section adding or eliminating the boundary point by making reference to the lengths before and after the boundary point is moved.

A program which is executed by a computer, the program comprising:

• obtaining a first length of a line segment between boundary points generated on a surface of a material;
• calculating a displacement of the boundary point according to a process model;
• moving the boundary point by the displacement;
• obtaining a second length of the line segment between the boundary points after the boundary point is moved;
• and
• making reference to the first and second lengths to add or eliminate the boundary point.