Method of manufacturing electron-emitting device, electron source and image-forming apparatus
AssigneeCanon Kabushiki Kaisha
InventorMitsutoshi Hasegawa
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AssigneeCanon Kabushiki Kaisha
InventorMitsutoshi Hasegawa
Estimating the term…
An electron-emitting device having an electroconductive film including an electron-emitting region arranged between a pair of device electrodes is manufactured. The electroconductive film is formed by applying a liquid containing the material of the film to a substrate by using an ink-jet method, then drying and heating the applied liquid. Defective conditions, if any, in the applied liquid or the precursor film formed by drying the liquid or the electroconductive film formed by heating the precursor film are detected and remedied by applying the same liquid again to the area detected for a defective condition. The detection and remedy of any defective condition may be conducted after the liquid-applying, drying or baking step.
A method of manufacturing an electron-emitting device having an electroconductive film including an electron-emitting region arranged between a pair of device electrodes, characterized in that the process of forming an electroconductive film including an electron-emitting region comprises steps of applying a liquid containing the material of the electroconductive film to a substrate by an ink-jet method and thereafter detecting any defective condition in the applied liquid and applying the liquid containing the material again to the area detected for a defective condition in said applied liquid by an ink-jet method.
Dependencies are inferred from the claim text.