Inductive-coupled plasma apparatus employing shield and method for manufacturing the shield

A method of manufacturing a shield of an apparatus for generating a high-density plasma using a coil having a plurality of turns and a dielectric window, comprising:

• performing an etching process using the plasma;
• examining a characteristic pattern of etched portions of a surface of the dielectric window;
• designating first portions of the dielectric window that are etched and second portions that are deposited;
• manufacturing the shield having a first portion corresponding to first portions of the dielectric window and a second portion that is opened corresponding to second portions of the dielectric window;
• and
• disposing the second portion of the shield at locations corresponding to areas between adjacent turns of the plurality of turns of the coil.

A plasma generator comprising:

• a coil having a plurality of turns generating radiation;
• a dielectric window through which the radiation is passed;
• and
• a capacitive shield disposed between said coil and said dielectric window, the capacitive shield having multiple openings and shielding portions,
• the shielding portions being disposed on the capacitive shield at areas corresponding to the coil to prevent capacitive coupling in an orthogonal direction between the coil and the dielectric window.