Lift-off resist compositions

A single layer lift-off resist composition comprising a novolac resin, a quinonediazidosulfonate photosensitive agent, and an aromatic hydroxy compound having at least one phenolic hydroxyl group in which the phenolic hydroxyl group is partially acylated, represented by the following general formula (1):

• 5
• wherein m is an integer of 0 to 2, n is an integer of 0 to 2, with the proviso that m is 1 or 2 when n is 0;
• R1 to R6 are independently hydrogen, methyl, a group of the following formula (2), or a group of the following formula (3);
• when n is 0 and m is 1, A is hydrogen, methyl or a group of the following formula (2);
• when n is 0 and m is 2, one of A is methylene or a group of the following formula (4), and the other of A is hydrogen, methyl or a group of the following formula (2);
• when n is 1, A is methylene or a group of the following formula (4);
• when n is 2 and m is 1, A is methine or a group of the following formula (5);
• and
• when n is 2 and m is 2, one of A is methylene or a group of the following formula (4), and the other of A is methane or a group of the following formula (5),
• with the proviso that at least one of R1 to R6 and A has a structure of a benzene ring having a hydroxyl group added thereto, 6
• wherein p, q, r and s are integers of 0 to 3, and t is an integer of 1 to 3.