Vertical low-pressure chemical vapor deposition furnace
OwnerChing-Yu Changinventor
Life of this patent
Estimating the term…
Abstract
A vertical low-pressure chemical vapor deposition furnace. The furnace includes an outer quartz tube, a heating device and a gas injector. The heating device is installed on the exterior sidewalls of the outer quartz tube for heating the quartz tube. The gas injector includes an entrance section, a looping main body and an outlet section. The input section penetrates a hole on the lower sidewall of the outer quartz tube. The looping main body is positioned between the outer quartz tube and a quartz boat. One end of the looping main body is connected to the input section while the other end is connected to the output section. Reactive gases flowing into the input section is preheated in the looping main body before delivering into the reaction chamber.
Claims15
A vertical low-pressure chemical vapor deposition (LPCVD) furnace, comprising:
- an outer quartz tube having a hole near the bottom of the sidewall;
- a heating device around the exterior sidewall of the outer quartz tube for heating the outer quartz tube;
- and
- a gas injector having an entrance section, a looping main body and an outlet section, wherein the entrance section passes through the hole, the looping main body is inside the outer quartz tube and extends into a portion of the heating device, one end of the loop main body connects with the entrance section while the other end connects with the outlet section so that reactive gases passing into the gas injector from the entrance section can be preheated before delivering to the reaction chamber inside the outer quartz tube via the outlet section.
A vertical low-pressure chemical vapor deposition (LPCVD) furnace, comprising:
- an outer quartz tube having a hole near the bottom of the sidewall;
- a heating device around the exterior sidewall of the outer quartz tube for heating the furnace;
- a quartz boat positioned inside the outer quartz tube for mounting a plurality of wafers;
- an inner quartz tube positioned on the inner sidewall of the outer quartz tube for laminar flow control;
- a gas injector having an entrance section, a looping main body and an outlet section, wherein the entrance section passes through the hole, the looping main body is inside the outer quartz tube and extends into a portion of the heating device, one end of the loop main body connects with the entrance section while the other end connects with the outlet section so that reactive gases passing into the gas injector from the entrance section can be preheated before delivering to the reaction chamber inside the outer quartz tube via the outlet section;
- and
- a group of thermocouples positioned inside the outer quartz tube for measuring furnace temperature.
Dependencies are inferred from the claim text.