Method of highly purifying Si surface and a atomically flattening method for an Si surface
OwnerShinichi Higai, Takahisa Oonoinventors
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Abstract
Metal impurities, particularly, Ni as a transition metal under the Si surface which are mainly attributable to surface defects are removed to highly purify the Si surface, and the Si surface is atomically flattened correspondingly by hydrogenating the Si surface containing metal impurities under the surface by means of a gas phase process or a liquid phase process, thereby extracting the metal impurities onto the Si surface.
Claims9
A method of highly purifying Si surface by hydrogenating the Si surface containing metal impurities under the surface as a gas phase method or liquid phase method thereby extracting the metal impurities onto the Si surface and removing the metal impurities.
A method of atomically flattening Si surface by hydrogenating the Si surface containing metal impurities under the surface as a gas phase method or liquid phase method thereby extracting the metal impurities onto the Si surface and removing the metal impurities.
A method of highly purifying surface of C, Ge, Sn or Pb by hydrogenating the surface containing metal impurities under the surface as a gas phase method or liquid phase method thereby extracting the metal impurities onto the surface and removing the metal impurities.
A method of atomically flattening surface of C, Ge, Sn or Pb by hydrogenating the surface containing metal impurities under the surface as a gas phase method or liquid phase method thereby extracting the metal impurities onto the surface and removing the metal impurities.
Dependencies are inferred from the claim text.