Lamp annealing apparatus and method of manufacturing semiconductor device

A lamp annealing apparatus, comprising:

• a lamp unit for heating at an upper portion of a chamber;
• and
• a reflector for stabilizing temperature at an lower portion of the chamber,
• in which process gas is supplied to a side of a front surface having an element forming surface of a semiconductor wafer located on a rotating cylinder in the chamber to be rotated, and
• rear face gas for preventing cloud of the surface of said reflector is supplied to a side of a rear surface of said semiconductor wafer,
• wherein said front surface side and said rear face side of said semiconductor wafer contact with gases having different composition, each other.

A method of manufacturing a semiconductor device comprising steps of:

• setting a semiconductor wafer on a supporting member in a chamber, said semiconductor wafer having a front surface on which semiconductor elements are to be formed and a rear surface, said chamber having a lamp unit for heating at an upper portion of a chamber and a reflector for stabilizing temperature at an lower portion of the chamber;
• supplying process gas to a side of said front surface of said semiconductor wafer and rear face gas for preventing cloud of the surface of said reflector to a side of said rear surface of said semiconductor wafer, said rear gas being nitrogen gas containing a minor mount of oxygen gas;
• and
• heating said semiconductor wafer by said lamp unit.