Surface treatment agent for resist pattern, and patterning process
OwnerToshihiko Fujii, Hideto Katoinventors
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Abstract
A surface treatment agent comprises an oligomeric or polymeric silicon-containing compound having an epoxycyclohexyl, glycidoxy, N-β-aminoethylamino, amino, N-phenylamino, mercapto or isocyanate group. When the surface treatment agent is applied to a metal or metal oxide substrate prior to formation of a resist pattern thereon, it serves to strengthen adhesion between the substrate and the photoresist film.
Claims6
A surface treatment agent which, when applied to a substrate prior to formation of a resist pattern thereon, strengthens adhesion between the substrate and the resist pattern, the surface treatment agent comprising at least one compound of the following compositional formula:
- R1R2a(OX)bSiO(3-a-b)/2 (1)
- wherein R1 is a —(CH2)nY moiety in which Y is epoxycyclohexyl, glycidoxy, N-β-aminoethylamino, amino, N-phenylamino, mercapto or isocyanate, and n is an integer from 0 to 4;
- R2 is a monovalent hydrocarbon group of 1 to 4 carbons;
- X is hydrogen or a monovalent hydrocarbon group of 1 to 4 carbons;
- “a” is 0 or 1, and “b” is 0, 1 or 2 when “a” is 0, and “b” is 0 or 1 when “a” is 1.
Dependencies are inferred from the claim text.