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US 2001/0011876 A1Published application
Substrate transfer system
AssigneeTazmo Co., Ltd.
InventorsKousaku Saino, Takahiro Kobiki
Life of this patent
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AssigneeTazmo Co., Ltd.
InventorsKousaku Saino, Takahiro Kobiki
Estimating the term…
A substrate transfer system comprises plural end-effectors that are placed so as to touch a periphery of a cone having a vertical angle at a 2θ angle with respect to a central axis at an arbitrary 0 angle to a horizontal plane, wherein substrates are interchanged and simultaneously transferred where the end-effectors are in a horizontal position. Besides, since the end-effectors are vertically located, the minimum rotational radius of the system that is projected to a horizontal plane, can be reduced. This contributes toward the reduction of an installation area for a substrate processing equipment in which the substrate transfer system is equipped.
A substrate transfer system which transfers a substrate such as a silicon wafer by using a robot hand:
The substrate transfer system according to claiml, wherein the robot hand is rotatably provided on a base, and includes first and second arms which are linked with each other, and wherein the end-effector is rotatably supported on a slope formed in a rotational head which is rotatably provided on a distal end of the second arm.
A substrate transfer system which transfers a substrate such as a silicon wafer by using a robot hand:
A substrate transfer system which transfers a substrate such as a silicon wafer by using a robot hand:
Dependencies are inferred from the claim text.