US 2001/0011653 A1 · Heat treatment apparatus

Abstract

A heat treatment table is divided into two or more regions, a heater is disposed for each region. On a predetermined portion of the heat treatment table, a plurality of sensors are disposed separately each other. A relation between temperatures of the respective portions on the heat treatment table and temperatures detected by the sensors is grasped in advance, thereby enables to surmise a temperature of the respective portion of the heat treatment table from the temperature detected by the sensors. In the case of an wafer being actually treated by placing on the heat treatment table, the temperatures detected by the sensors are observed, from these detected temperatures, the temperatures of the respective portions on the heat treatment table, that is, temperatures affecting the wafer, are surmised.

Claims36

Dependent claims

A heat treatment apparatus, which comprises:

a heat treatment table thereon a substrate to be treated is disposed;
two or more of heaters heating each regions obtained by dividing the heat treatment table into two or more;
at least one sensor detecting temperature of the predetermined portion of the heat treatment table;
a means for surmising the temperature of each portions of the heat treatment table based on the detected temperature;
and
a means for controlling output of the each heaters based on the detected temperature so that the temperature of the entire heat treatment table is uniform.

3 more elements

A heat treatment apparatus, which comprises:

a heating means for heating a lower surface of a substrate to be treated;
a means for evacuating a gas heated by the heating means from an upper portion of the substrate to be treated;
a means for detecting a temperature affecting the substrate to be treated;
and
a means for cooling, based on the detected temperature, a gas passing through the above portion of the substrate to be treated.

2 more elements

Dependencies are inferred from the claim text.

Heat treatment apparatus

Life of this patent

Heat treatment apparatus

Life of this patent

Abstract

Claims36