Linear aperture deposition apparatus and coating process

A linear aperture deposition apparatus for coating a substrate, comprising:

• (a) a crucible containing a charge of source material and disposed within a source box, the crucible having a width W2;
• (b) a first baffle having a plurality of holes therethrough and adapted to maintain a position on an upper surface of the source material as the source material evaporates;
• (c) a heating element within the source box adapted to heat the source material to produce a vapor of the source material;
• (d) a chimney having at least one inlet in communication with the source box and a rectangular slot outlet for directing the vapor from the source box to the substrate, the chimney having a height H and the rectangular slot outlet having a width W1, a length L, and being disposed a distance D from the substrate;
• (e) a second baffle disposed within the source box and configured to restrict the flow of vapor from the source box to the substrate;
• and
• (f) a containment and cooling vessel disposed around the source box and configured to prevent heating of the substrate.

A process for physical vapor deposition of a source material onto a substrate, the process comprising the steps of:

• (a) providing a source material within a source box;
• (b) heating the source material to form a vapor;
• (c) restricting the flow of vapor out of the source box to form a plume of vapor substantially free of solid particulate source material;
• and
• (d) transporting the substrate across the vapor plume to cause solid source material to coat the substrate.