Chemical vapor deposition apparatus

Abstract

A chemical vapor deposition apparatus comprising: a reaction chamber for defining an enclosed space; a pedestal arranged within the reaction chamber on which a substrate is settled; heater means arranged within the pedestal for heating the substrate; a gas inlet for introducing gas into the reaction chamber; a gas outlet for exhausting gas from the reaction chamber; and a gas injector extended from the end of the gas inlet, wherein the gas injector has a hollow side wall so that a heat exchanging medium can flow through the side wall, and inlet and outlet ports arranged in the outside of the sidewall, each of the inlet and outlet ports communicating with the inside of the side wall. Here, the outlet port is arranged higher than the inlet port. Also, the apparatus further comprises a partition for dividing the inside of the side wall of the gas injector with an inlet port side and an outlet port side, wherein the upper end of the partition does not reach the inner upper surface of the side wall whereby the heat exchanging medium can flow from the inlet port side to the outlet port side. According to the invention, only the temperature of the gas injector can be adjusted by circulating the heat exchange medium to the gas injector.

Dependencies are inferred from the claim text.